Pleated Box Type
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Chemsorb Box Type Chemical Filter - The Choice for Higher Efficiency and Capacity!
The BOX type chemical air filter was developed for use in make-up air units (MAUs), fan filter units (FFUs) & return air units (RCUs), and it offers low pressure loss, high removal efficiency and a long duration.
This type of chemical air filter was made of premium/impregnated activated carbons, sandwiched in two layers of fabrics with our point contact binding technology, which promises minimal coverage of the granule surface. The uncovered granule surface is exposed to contaminated air for maximum gas adsorbing efficiency and capacity.
Features and Characteristics :
☆ Single filter to remove acid gases, base gases or VOC gases. 2-in-1 & 3-in-1 to remove different classes of gases in a filter.
☆ Low pressure drop ( 100 Pa @ 2.5 m/sec )、High air permeability
☆ Higher initial removal efficiency ( > 95% )
☆ Long service lifespan with high adsorption capacity ( lifespan: 6-24 month )
☆ No out-gassing (No organic and inorganic out-gassing)
☆ Low dust emission - clean operation (ISO Class 7 or better)
☆ Highly customizable to make the filter to meet customer's specific requirements
☆ Total solution to mitigate AMC/IAQ problems
☆ Retrofit (or tailor-made) to existing MAU、RCU or FFU system
☆ Selected to incorporate electrostatic fabrics to offer MERV 8 filtration efficiency - A combo for particulate and gas filtration.
Media :
＊ Coconut shell activated carbon (CTC90； Surface Area：1400 m²/g) / Impregnated activated carbon
＊ Media Type：ChemSorb Molecular Filtration Media
＊ Frame：Galvanized Steel / Aluminum / SUS
＊ Filter Size：24"x24"x12", 24"x24"x6", 12"x24"x12", 12"x24"x6" or other sizes available!
Applications :
☆ Airports
☆ Hospitals/Morgues
☆ Office buildings
☆ Cleanrooms (MAU, RCU, FFU)
☆ Pharmaceuticals/Petrochemicals
☆ Microelectronics/Semiconductor/TFT LCD
☆ Industrial processes/New constructions
☆ Restaurants/Bars/Casinos/Bingo Halls
☆ Sports arenas/Nail Salons/Smoking lounges
☆ Museums/Libraries
☆ Sewage treatment plants
☆ Photolithography (acid/amine etching processes)
Standard Filter Sizes
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Article No. |
Actual Size (mm) |
Pressure Drop |
Functions |
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PAG-242412 |
595x595x290 605x605x290 610x610x290 |
100 pa @ 2.5 m/s |
Acids (H2S、SO2、HNO3、HCl、HF、H2SO4、Cl2、ClO2、BF3、VOCs..) |
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PAG-242412 |
595x595x290 605x605x290 610x610x290 |
15 pa @ 0.6 m/s |
Acids (H2S、SO2、HNO3、HCl、HF、H2SO4、Cl2、ClO2、BF3、VOCs..) |
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PAG-242406 |
595x595x150 605x605x150 610x610x150 |
75 pa @ 1.0 m/s |
Acids (H2S、SO2、HNO3、HCl、HF、H2SO4、Cl2、ClO2、BF3、VOCs..) |
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PBG-242412 |
595x595x290 605x605x290 610x610x290 |
100 pa @ 2.5 m/s |
Base/Alkali (NH3, NMP, Amines) |
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PBG-242412 |
595x595x290 605x605x290 610x610x290 |
15 pa @ 0.6 m/s |
Base/Alkali (NH3, NMP, Amines) |
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PBG-242406 |
595x595x150 605x605x150 610x610x150 |
75 pa @ 1.0 m/s |
Base/Alkali (NH3, NMP, Amines) |
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PCG-242412 |
595x595x290 605x605x290 610x610x290 |
100 pa @ 2.5 m/s |
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PCG-242412 |
595x595x290 605x605x290 610x610x290 |
15 pa @ 0.6 m/s |
VOC (Xylene, Toluene, PGME, PGMEA, MEK, FC-43, FC-3277, CS2, HFE 7200, Acetone, IPA, Silicons, Ozone, Organic Boron/ Phosphor, Hydrogen Carbon, Organic Sulfur |
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PCG-242406 |
595x595x150 605x605x150 610x610x150 |
75 pa @ 1.0 m/s |
VOC (Xylene, Toluene, PGME, PGMEA, MEK, FC-43, FC-3277, CS2, HFE 7200, Acetone, IPA, Silicons, Ozone, Organic Boron/ Phosphor, Hydrogen Carbon, Organic Sulfur |
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PHG-242412 |
595x595x290 605x605x290 610x610x290 |
125 pa @ 2.5 m/s |
Acids, Bases/Alkali, VOCs |